Research on Photocatalytic Activity and Electronic Structure of TiO2-xN_x Thin Films
Rare Metals and Cemented Carbides | Vol., Issue 1, 2013 |
pp. 45-49
TiO2-Nx thin films were successfully deposited onto microscope glass slides by RF sputtering technology with different flow ratio of oxygen to nitrogen. Photocatalytic activity of the obtained thin films was evaluated by photodegradation tests of methylene blue. XRD patterns and transmission spectra of the films were determined. The energy band structure and density of electronic states (DOS) near Fermi level of N-doped anatase TiO2 were calculated using the first principle based on density functional theory (DFT). The results indicate that the TiO2-xNx thin film prepared with 50 sccm O2 flow rate and 0.5 sccm N2 flow rate has the highest photocatalytic activity. Compared with pure TiO2, N-doped TiO2 has no change in crystal structure, but its absorption edge shows red shift. N doping makes the band gap of TiO2 decreased and DOS movement towards the low-energy side, resulting in light response region extended and photocatalytic activity enhanced.
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