Study on Preparation and Texture of High Purity Tantalum Targets AITranslate

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Chinese Library Classification Number:TG146.416[金属学及工艺—金属材料]

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Based on the domestic and foreign literature,the influence of grain size and texture on the sputtering yield of tantalum targets is analyzed,and it is considered that the tantalum target with fine and uniform grains has relatively high sputtering yield.High purity tantalum ingots were used to prepare tantalum targets through large deformation forging combined with rolling and vacuum annealing.The microstructure,grain size,and texture composition of the tantalum targets were analyzed using metallographic microscope and EBSD technology.The results indicate that by increasing the forging deformation of the ingot,the tantalum target can obtain fine and uniform grains in the thickness direction,and its texture is uniformly distributed randomly in the thickness direction.