High-Luminescence and Submillimeter-Scale MoS2 Monolayer Growth Using Combinational Phase Precursors via Chemical Vapor Deposition AITranslate
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We successfully synthesize high-luminescence and submillimeter-scale monolayers of molybdenum disulfide (MoS2) employing a combinational phase precursor via a chemical vapor deposition (CVD) approach. First, sodium nitrate catalyst is demonstrated to assist the reaction equilibrium of a solid precursor CVD process, leading to an increased density and size of MoS2 monolayer flakes (∼120 μm). However, the monolayers’ photoluminescence intensity is significantly reduced due to the presence of excess residues. A suspension solution-based precursor is also tested using the optimized temperature, pressure, and catalyst from the solid precursor case, and it is found to also give a high density of uniform triangles with an average size of ∼80 μm. Finally, combining both precursor phases (combinational phase precursor) yields the largest monolayer flakes with an average size of ∼200 μm and the highest luminescence, with photoluminescence intensities being 1 order of magnitude higher than that of a standard mechanical exfoliated monolayer.
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DOI:https://doi.org/10.1021/acsaelm.2c01162
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We successfully synthesize high-luminescence and submillimeter-scale monolayers of molybdenum disulfide (MoS2) employing a combinational phase precursor via a chemical vapor deposition (CVD) approach. First, sodium nitrate catalyst is demonstrated to assist the reaction equilibrium of a solid precursor CVD process, leading to an increased density and size of MoS2 monolayer flakes (∼120 μm). However, the monolayers’ photoluminescence intensity is significantly reduced due to the presence of excess residues. A suspension solution-based precursor is also tested using the optimized temperature, pressure, and catalyst from the solid precursor case, and it is found to also give a high density of uniform triangles with an average size of ∼80 μm. Finally, combining both precursor phases (combinational phase precursor) yields the largest monolayer flakes with an average size of ∼200 μm and the highest luminescence, with photoluminescence intensities being 1 order of magnitude higher than that of a standard mechanical exfoliated monolayer.
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| GB/T 7714-2015 | [1] Ary Anggara Wibowo, Mike Tebyetekerwa, Anh Dinh Bui, et al. ACS Applied Electronic Materials, 2022(4). DOI:10.1021/acsaelm.2c01162. |
| MLA | [1] Ary Anggara Wibowo, et al., ACS Applied Electronic Materials, no. 4, 2022, https://doi.org/10.1021/acsaelm.2c01162. |
| APA | [1] Ary Anggara Wibowo, Mike Tebyetekerwa, Anh Dinh Bui, Felipe Kremer, Sandra Saji, Zongyou Yin, Yuerui Lu, Daniel Macdonald, & Hieu T. Nguyen. (2022). ACS Applied Electronic Materials(4). https://doi.org/10.1021/acsaelm.2c01162 |
| IEEE | [1] Ary Anggara Wibowo, Mike Tebyetekerwa, Anh Dinh Bui, Felipe Kremer, Sandra Saji, Zongyou Yin, Yuerui Lu, Daniel Macdonald, and Hieu T. Nguyen, ACS Applied Electronic Materials, no. 4, 2022, doi: 10.1021/acsaelm.2c01162. keywords: {chemical vapor deposition catalyst MoS2 photoluminescence monolayers} |
