Effects of Annealing Temperature on Phase Change of TiO_2 Thin Film Prepared by Magnetron Sputtering AITranslate
Abstract AITranslate
TiO_2 thin film was prepared by using RF magnetron sputtering and characterized with X-ray diffraction,scanning electron microscopy and four-probe method.The effects were studied of annealing temperature on the morphology,microstructure and electrical performance of TiO_2 thin film at an argon atmosphere.The results show that the film has uniform particle size and compact surface structure under the conditions of argon atmosphere and 600 ℃ annealing temperature.The film has a single anatase phase at400～600 ℃ annealing temperature and an amorphous phase at 700 ℃ annealing temperature,and it is completely transformed into rutile phase at 800℃annealing temperature.TiO_2 thin film annealed at 500℃has the lowest resistivity and the best electrical performance.
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1FUJISHIMA A, HONDA K. Photolysis-decomposition of water at the surface of an irradiated semiconductor [J]. Nature,1972,238(1) :37-41.
2钟敏,韦之豪,司平占,李红,卫国英,葛洪良,韩高荣.掺铁二氧化钛纳米晶的制备及其光催化性能[J].硅酸盐学报,2010,38(1):68-73. 被引量：37
3姚宁,张利伟,鲁占灵,杨仕娥,樊志琴,张兵临.直流反应溅射TiO_2薄膜的制备及其性能研究[J].真空,2005,42(1):18-21. 被引量：6
4李文甫,胡晓斌,赵斌元.二氧化钛光子晶体的制备及其光学性能的研究[J].功能材料,2010,41(A03):575-578. 被引量：3
5潘力军,金银龙.二氧化钛光催化降解饮用水有机污染物的研究进展[J].环境与健康杂志,2012,29(3):284-287. 被引量：12
6黄婉霞,孙作凤,吴建春,涂铭旌.纳米二氧化钛光催化作用降解甲醛的研究[J].稀有金属,2005,29(1):34-38. 被引量：53
7潘永强,朱昌,弥谦,宋俊杰.电子束蒸发TiO_2薄膜的光学特性[J].应用光学,2004,25(5):53-55. 被引量：9
8钱迪峰,张青红,万钧,李耀刚,王宏志.二氧化钛纳米晶溶胶内渗透电极对染料敏化太阳能电池的光伏性能的提高[J].物理化学学报,2010,26(10):2745-2751. 被引量：10
9肖尧明,吴季怀,岳根田,林建明,黄妙良,范乐庆,兰章.单晶二氧化钛纳米线的制备及其在柔性染料敏化太阳能电池中的应用[J].物理化学学报,2012,28(3):578-584. 被引量：23
10GRIBB A A, BANFIELD J F. Particle size effects on transformation kinetics and phase stability in nanocrys- talline TiO2 [J]. Am Mineralogist, 1977,82 (7/8) : 717- 728.
1王博,魏世丞,王玉江,郭蕾,梁义,潘复生,徐滨士.磁控溅射技术制备二氧化钛薄膜研究进展[J].表面技术,2018,47(8):257-264. 被引量：10
1刘瑞霞,郭锋,韩海鹏.铬过渡层对氮化铬/镁合金膜基界面结合强度的影响[J].金属热处理,2021,46(1):143-148. 被引量：2
2张健,牛夏斌,孟辉波,齐振华,李建浩.探究氧气流量对新型高阻隔薄膜材料的制备及性能的影响[J].真空科学与技术学报,2021,41(7):694-698. 被引量：1
3杨梦熊,惠迎雪.基于硅靶和碳化硅靶的碳化硅薄膜磁控溅射工艺对比[J].表面技术,2021,50(9):134-140.
4胡晋威.针对影响二氧化钛薄膜微细图形物性因素的探究[J].当代化工研究,2021(21):63-65.
5王丽莹,王婷,冯鸿蒞,林鹏,袁小红.织物基Al/TiO_(2)纳米复合膜的性能研究[J].纺织科学与工程学报,2022,39(1):72-77.
6谭心,徐宏飞,孟可可.纳米金刚石TiV色心的实验制备与性能研究[J].表面技术,2022,51(3):192-198. 被引量：1
7陈功,宗律,张鑫道,潘俊杰,吴峰,王䶮,苏鹏举.用改进灰关联法研究磁控溅射工艺参数对二氧化钛镀膜的影响[J].电镀与涂饰,2022,41(6):437-445.
8毛雅梅,黑鸿君,高洁,张孟,王垚,郑可,于盛旺.Ta涂层对CVD单晶金刚石焊接强度的影响[J].表面技术,2022,51(11):445-451.
9李昌恒,刘奎仁,魏世丞,韩庆,王博,王玉江.磁控溅射技术制备氮化钛薄膜的研究进展[J].材料保护,2023,56(2):111-119. 被引量：1
10李昌恒,刘奎仁,魏世丞,韩庆,王博,王玉江.磁控溅射工艺参数对TiAlN薄膜结构和性能影响规律研究[J].稀有金属与硬质合金,2023,51(1):70-76.
1梅海林,唐立丹,王冰,董国建.磁控溅射TiO_2薄膜的相结构转变温度[J].金属热处理,2016,41(9):48-51. 被引量：2
2张保丰,刘德波,周亚军,蒋爱云.TiO_2薄膜制备技术研究进展[J].热加工工艺,2012,41(22):153-156. 被引量：7
3何鹏,颜家振,黄婉霞,张月,罗蓉蓉,蔡靖涵.退火升温速率对VO_2薄膜相变性能的影响[J].稀有金属材料与工程,2010,39(5):867-870. 被引量：5
4于春杭,邵红红,许晓静.钛基材纳米化对TiO_2薄膜力学性能影响研究[J].稀有金属材料与工程,2012,41(2):320-323. 被引量：5
5鞠洪博,喻利花,许俊华.不同调制比NbSiN/VN多层膜微观结构、力学和摩擦性能研究[J].真空科学与技术学报,2014,34(3):241-244. 被引量：5
6陈超,鞠洪博,喻利花,许俊华.V含量对CrSiVN薄膜微观结构和摩擦性能的影响[J].真空科学与技术学报,2013,33(9):853-857. 被引量：2
7张志,陈忠家,姚奇,蒙广建.分级均匀化处理对7068新型高强铝合金组织及性能的影响[J].有色金属加工,2014,43(5):13-17. 被引量：4
8许俊华,鞠洪博,喻利花.Mo含量对TiMoN薄膜微观组织和摩擦磨损性能的影响[J].金属学报,2012,48(9):1132-1138. 被引量：24
9刘小磐,万隆,胡伟达,汪洋.TiO_2薄膜对金刚石磨料的抗氧化性能及磨削性能的影响[J].硅酸盐学报,2009,37(2):225-230. 被引量：4
10鞠洪博,喻利花,许俊华.不同调制周期TiAlSiN/Mo_2N多层膜的微观结构、力学和摩擦性能研究[J].真空科学与技术学报,2014,34(6):620-624. 被引量：6
Basic Information:
DOI：
Chinese Library Classification Number:TG174.444[金属学及工艺—金属表面处理]
Citation Information:
TiO_2 thin film was prepared by using RF magnetron sputtering and characterized with X-ray diffraction,scanning electron microscopy and four-probe method.The effects were studied of annealing temperature on the morphology,microstructure and electrical performance of TiO_2 thin film at an argon atmosphere.The results show that the film has uniform particle size and compact surface structure under the conditions of argon atmosphere and 600 ℃ annealing temperature.The film has a single anatase phase at400～600 ℃ annealing temperature and an amorphous phase at 700 ℃ annealing temperature,and it is completely transformed into rutile phase at 800℃annealing temperature.TiO_2 thin film annealed at 500℃has the lowest resistivity and the best electrical performance.
quote
| GB/T 7714-2015 | [1] MEI Hai-lin, TANG Li-dan, WANG Bing, et al. Effects of Annealing Temperature on Phase Change of TiO_2 Thin Film Prepared by Magnetron Sputtering[J]. Rare Metals and Cemented Carbides, 2016(5): 60-63. |
| MLA | [1] MEI Hai-lin, et al., "Effects of Annealing Temperature on Phase Change of TiO_2 Thin Film Prepared by Magnetron Sputtering." Rare Metals and Cemented Carbides, no. 5, 2016, pp. 60-63. |
| APA | [1] MEI Hai-lin, TANG Li-dan, WANG Bing, & MEI Si-han. (2016). Effects of Annealing Temperature on Phase Change of TiO_2 Thin Film Prepared by Magnetron Sputtering. Rare Metals and Cemented Carbides(5), 60-63. |
| IEEE | [1] MEI Hai-lin, TANG Li-dan, WANG Bing, and MEI Si-han, "Effects of Annealing Temperature on Phase Change of TiO_2 Thin Film Prepared by Magnetron Sputtering," Rare Metals and Cemented Carbides, no. 5, pp. 60-63, 2016. keywords: {TiO2 thin film;magnetron sputtering;anatase;rutile;annealing temperature} |