Research Progress on Influences of CeO_2 Polishing Powder Particle Size on Polishing Process and the Related Mathematical Models AITranslate
Abstract AITranslate
The measurement methods are introduced for particle size of CeO2 polishing powders. Research progress are reviewed on the influences of the particle size on polishing process and the related mathemati-cal models. Meanwhile, the existing problems and future research direction of CeOz polishing are pointed out.
KeyWords AITranslate
1宋晓岚,李宇焜,江楠,屈一新,邱冠周.化学机械抛光技术研究进展[J].化工进展,2008(1):26-31. 被引量:43
2郭瑞华,李梅.稀土抛光粉的发展现状及应用[J].稀土,2005,26(1):82-85. 被引量:12
3李学舜.稀土抛光粉的生产及应用[J].中国稀土学报,2002,20(5):392-397. 被引量:48
4GB/T20170.12006.稀土金属及其化合物物理性能测试方法-稀土化合物粒度分布的测定[s].
5谢圣中,王柏春,许向阳.纳米氧化铈颗粒的粒度分析研究[J].金属材料与冶金工程,2007,35(6):3-7. 被引量:2
6陆厚根.粉体工程导论[M].上海:同济大学出版社,2006.
7叶红齐,李艳红,周永华,林京福.氧化铈抛光粉精密分级控制粒度的研究[J].中国粉体技术,2002,8(5):5-7. 被引量:8
8JISR6002-1998.结接磨料粒度的试验方法[s].
9GB/T20165-2006.稀土抛光粉[s].
10Chandrasekaran N, Taylor T, Sabde G. Effect of ceria particle-size distribution and pressure interactions in chemo-mechanical polishing (CMP) of dielectric mate- rials [A]. Boning D, Devriendt K, Oliver M, et al. Materials Research Society Symposium Proceeding [C]. Edinburgh : Cambridge University Press, 2003.
1吕逢娇.二氧化铈抛光材料应用的研究进展[J].新材料产业,2014(2):56-59. 被引量:8
2柳召刚,张盼,李梅,胡艳宏,王觅堂,陶豹.纯铈稀土抛光粉中氟行为的研究[J].稀土,2014,35(2):13-18. 被引量:10
3任元,刘学杰,卞志倩.过渡金属原子固溶在CeO_2中结构与力学性能研究[J].稀土,2015,36(6):25-31.
1贾慧灵,徐阳,吴锦绣,黄智国,谭心.制备条件对二氧化铈稀土抛光粉性能的影响[J].稀土,2022,43(4):37-45. 被引量:1
2王金普,白林山,储向峰.不同磨料对微晶玻璃化学机械抛光的影响[J].纳米技术与精密工程,2015,13(1):74-79. 被引量:3
3陈勇,陈月,邱长军,樊湘芳.CeO_2纳米杆的制备与表征[J].南华大学学报:自然科学版,2015,29(2):63-65. 被引量:1
4刘振东,李运领,张海龙.表面改性CeO_2基抛光粉在水介质中的悬浮稳定性[J].稀土,2015,36(4):67-74. 被引量:5
5程磊,任慧平,崔凌霄,金自力.铈基稀土抛光粉组织结构研究[J].稀土,2015,36(6):45-50. 被引量:2
6桂阳海,张宏忠,李栋伟,赵建波,田俊峰,李海利.纳米氧化镧铈/石墨烯材料的制备及抛光性能研究[J].化工新型材料,2016,44(4):234-236.
7黄令漫,郝志庆,萧桐.共沉淀法制备超细含氟铈基抛光粉[J].稀土,2016,37(3):100-104. 被引量:2
8李梅,杨来东,柳召刚,王觅堂,胡艳宏.粒度及粒度分布对铈基稀土抛光粉性能影响的研究[J].稀土,2016,37(4):144-147. 被引量:4
9伍立军,王筠松,郭耘,卢冠忠.氟镧镨掺杂对铈基抛光粉微结构、颗粒特征及抛光性能的影响[J].中国稀土学报,2016,34(5):606-611. 被引量:3
10杨国胜,崔凌霄,谢兵,吴文远.氟对铈基稀土抛光粉性能的影响研究[J].稀土,2016,37(6):80-85. 被引量:9
1谢会东,王晓青,沈光球.晶体的超精密抛光[J].人工晶体学报,2004,33(6):1035-1040. 被引量:17
2谢圣中,许向阳,王绍斌,翟海军,刘学璋.水基纳米金刚石悬浮液的制备与应用[J].工业金刚石,2010(1):49-52.
3何捍卫,胡岳华,周科朝,徐竞.金属的化学-机械抛光技术研究进展[J].应用化学,2003,20(5):415-419. 被引量:8
4么艳平,张玉兰,李长江,刘景和.ZnSe多晶化学机械抛光研究[J].人工晶体学报,2006,35(6):1378-1382. 被引量:5
5王浪,冯伟,杨连乔,张建华.化学气相沉积法制备石墨烯的铜衬底预处理研究[J].物理学报,2014(17):217-223. 被引量:9
6周新木,岑志军,李静,彭欢,李永绣.掺氟复合磨料的制备及对单晶硅抛光性能的影响[J].稀土,2012,33(6):1-4. 被引量:10
7李熹.煤的氩离子抛光-扫描电镜分析样品制备研究[J].广州化工,2016,44(12):127-129.
8王晓宇.电极表面新型处理装置研究与应用[J].科技信息,2012(14):343-343. 被引量:1
9周新木,王爱勤,李静,阮桑桑,李永绣.高密度碳酸稀土制备超细抛光粉的研究[J].稀土,2015,36(5):21-25. 被引量:3
10钟雨航,朱世富,赵北君,任锐,何知宇,叶林森,温才.CdSe探测器晶片化学机械抛光工艺研究[J].人工晶体学报,2006,35(5):939-942. 被引量:2
Basic Information:
DOI:
Chinese Library Classification Number:O614.332[理学—无机化学]
Citation Information:
The measurement methods are introduced for particle size of CeO2 polishing powders. Research progress are reviewed on the influences of the particle size on polishing process and the related mathemati-cal models. Meanwhile, the existing problems and future research direction of CeOz polishing are pointed out.
quote
| GB/T 7714-2015 | [1] LIU Jun, SONG Xiao-lan. Research Progress on Influences of CeO_2 Polishing Powder Particle Size on Polishing Process and the Related Mathematical Models[J]. Rare Metals and Cemented Carbides, 2013(2): 21-24. |
| MLA | [1] LIU Jun, and SONG Xiao-lan. "Research Progress on Influences of CeO_2 Polishing Powder Particle Size on Polishing Process and the Related Mathematical Models." Rare Metals and Cemented Carbides, no. 2, 2013, pp. 21-24. |
| APA | [1] LIU Jun, & SONG Xiao-lan. (2013). Research Progress on Influences of CeO_2 Polishing Powder Particle Size on Polishing Process and the Related Mathematical Models. Rare Metals and Cemented Carbides(2), 21-24. |
| IEEE | [1] LIU Jun and SONG Xiao-lan, "Research Progress on Influences of CeO_2 Polishing Powder Particle Size on Polishing Process and the Related Mathematical Models," Rare Metals and Cemented Carbides, no. 2, pp. 21-24, 2013. keywords: {CeO2 polishing powder;particle size;particle size distribution;polishing;mathematical model} |
