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Temperature-Dependent Phase Stable Hybrid Halide Perovskite Films by Chemical Vapor Deposition AITranslate

University of Missouri; University of the Western Cape; University of Missouri; Argonne National Laboratory; University of Missouri; University of the Western Cape
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Publisher: ACS
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Abstract AITranslate

Methylammonium lead iodide (MAPbI3–xClx) thin films were synthesized using chemical vapor deposition. Temperature-dependent grazing incidence synchrotron-based X-ray diffraction measurements confirm that the structure of MAPbI3–xClx, where Cl acts more like a dopant, remains throughout in the tetragonal phase in the temperature range of 20–300 K. These studies are further correlated with temperature-dependent photoluminescence (PL) studies. The PL peak energy monotonically increases with temperature, suggestive of a single-phase behavior. Resistance measurements conducted as a function of temperature show an absence of inflection points, suggesting uniformity in its phase. Between 200 and 325 K, the resistance remains a constant.

KeyWords AITranslate

halide perovskite Xray diffraction chemical vapor deposition electrical transport thermal stability
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DOI:https://doi.org/10.1021/acsaelm.2c00449

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Citation Information:

Methylammonium lead iodide (MAPbI3–xClx) thin films were synthesized using chemical vapor deposition. Temperature-dependent grazing incidence synchrotron-based X-ray diffraction measurements confirm that the structure of MAPbI3–xClx, where Cl acts more like a dopant, remains throughout in the tetragonal phase in the temperature range of 20–300 K. These studies are further correlated with temperature-dependent photoluminescence (PL) studies. The PL peak energy monotonically increases with temperature, suggestive of a single-phase behavior. Resistance measurements conducted as a function of temperature show an absence of inflection points, suggesting uniformity in its phase. Between 200 and 325 K, the resistance remains a constant.

quote

GB/T 7714-2015 [1] Randy Burns, Siphelo Ngqoloda, Stephen C. Klue, et al. ACS Applied Electronic Materials, 2022(4). DOI:10.1021/acsaelm.2c00449.
MLA [1] Randy Burns, et al., ACS Applied Electronic Materials, no. 4, 2022, https://doi.org/10.1021/acsaelm.2c00449.
APA [1] Randy Burns, Siphelo Ngqoloda, Stephen C. Klue, Evguenia Karapetrova, Christopher J. Arendse, & Suchismita Guha. (2022). ACS Applied Electronic Materials(4). https://doi.org/10.1021/acsaelm.2c00449
IEEE [1] Randy Burns, Siphelo Ngqoloda, Stephen C. Klue, Evguenia Karapetrova, Christopher J. Arendse, and Suchismita Guha, ACS Applied Electronic Materials, no. 4, 2022, doi: 10.1021/acsaelm.2c00449. keywords: {halide perovskite Xray diffraction chemical vapor deposition electrical transport thermal stability}