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Magnetic and electronic structures of Ba2MnMoO6 from first-principles calculations AITranslate

Changchun Institute of Applied Chemistry; Changchun Institute of Applied Chemistry; Changchun Institute of Applied Chemistry; Changchun Institute of Applied Chemistry; Changchun Institute of Applied Chemistry
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Publisher: Elsevier
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Abstract AITranslate

The magnetic and electronic properties of Ba2MnMoO6 are investigated by using the full-potential linearized augmented plane-wave method, with both generalized gradient approximations (GGA) and GGA + U approaches. The calculated results indicate that parameter U plays a vital role in the electronic structure characterization. The ground state is found to be antiferromagnetic and insulating. In terms of the Heisenberg model, the nearest-neighbor and the next-nearest-neighbor magnetic interaction parameters are determined to be J1 = −1.17 meV and J2 = −0.87 meV. The valence states of Mn and Mo are suggested to be divalent and hexavalent respectively, in agreement with the experimental data.

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DOI:https://doi.org/10.1016/j.commatsci.2010.05.005

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Citation Information:

The magnetic and electronic properties of Ba2MnMoO6 are investigated by using the full-potential linearized augmented plane-wave method, with both generalized gradient approximations (GGA) and GGA + U approaches. The calculated results indicate that parameter U plays a vital role in the electronic structure characterization. The ground state is found to be antiferromagnetic and insulating. In terms of the Heisenberg model, the nearest-neighbor and the next-nearest-neighbor magnetic interaction parameters are determined to be J1 = −1.17 meV and J2 = −0.87 meV. The valence states of Mn and Mo are suggested to be divalent and hexavalent respectively, in agreement with the experimental data.

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GB/T 7714-2015 [1] Shuhui Lv, Xiaojuan Liu, Hongping Li, et al. Computational Materials Science, 2010(49). DOI:10.1016/j.commatsci.2010.05.005.
MLA [1] Shuhui Lv, et al., Computational Materials Science, no. 49, 2010, https://doi.org/10.1016/j.commatsci.2010.05.005.
APA [1] Shuhui Lv, Xiaojuan Liu, Hongping Li, Zhijian Wu, & Jian Meng. (2010). Computational Materials Science(49). https://doi.org/10.1016/j.commatsci.2010.05.005
IEEE [1] Shuhui Lv, Xiaojuan Liu, Hongping Li, Zhijian Wu, and Jian Meng, Computational Materials Science, no. 49, 2010, doi: 10.1016/j.commatsci.2010.05.005.