Monolayer Capping Provides Close to Optimal Resistance to Laser Dewetting of Au Films Monolayer Capping Provides Close to Optimal Resistance to Laser Dewetting of Au Films AITranslate

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DOI：https://doi.org/10.1021/acsaelm.3c00052

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Next-generation heat-assisted magnetic recording (HAMR) relies on fast, localized heating of the magnetic medium during the write process. Au plasmonic near-field transducers are an attractive solution to this challenge, but increased thermal stability of Au films is required to improve long-term reliability. This work compares the effect of nanoscale Al, AlOx, and Ta capping films on Au thin films with Ti or Ta adhesion layers for use in HAMR and other high-temperature plasmonic applications. Thermal stability is investigated using a bespoke laser dewetting system, and SEM and AFM are extensively used to interrogate the resulting dewet areas. The most effective capping layers are found to be 0.5–1 nm of Al or AlOx, which can eliminate dewetting under certain conditions. Even one monolayer of AlOx is shown to be highly effective in reducing dewetting. In the case of thicker capping layers of Ta and AlOx, the Au film can easily dewet underneath, leaving an intact capping layer. It is concluded that thinner capping layers are most effective against dewetting as the Au cannot dewet without breaking them and pulling them apart during the dewetting process. A simple model based on energetics considerations is developed, which explains how thinner capping layers can more effectively protect the metal from pore or fissure creation. The model provides some convenient guidelines for choosing both the substrate and capping layer, for a given metal, to maximize the resistance to laser-induced damage.