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Dual-Channel WS2/WSe2 Heterostructure with Tunable Graphene Electrodes Dual-Channel WS2/WSe2 Heterostructure with Tunable Graphene Electrodes AITranslate

Sungkyunkwan University (SKKU); Sungkyunkwan University (SKKU); Sungkyunkwan University (SKKU); Sungkyunkwan University (SKKU); Sungkyunkwan University (SKKU); Sungkyunkwan University (SKKU)
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Publisher: ACS
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Abstract AITranslate

Two-dimensional semiconductor heterostructures provide significant research potential for electronic and optoelectronic applications because of their scaled thickness, pristine heterostructure interface, and ultrafast carrier transport. Herein, we report a dual-channel field-effect transistor based on n-type WS2 and p-type WSe2 layered heterostructure using multilayered graphene as electrodes to enable electron-dominated ambipolar electrical transport. WS2 exhibits mobility of 20 cm2 V–1 s–1 and an on/off ratio of 105, whereas WSe2 exhibits mobility of 5 cm2 V–1 s–1 and an on/off ratio of 104. Furthermore, our results show negative Schottky barrier heights between dual-channel heterostructure and multilayered graphene. The proposed design reduces complications in the fabrication of devices with integrated heterostructures, particularly for complementary metal-oxide semiconductor inverter applications.

KeyWords AITranslate

graphene electrode dual channel gate tunable WSe2 WS2
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Basic Information:

DOI:https://doi.org/10.1021/acsaelm.2c01465

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Citation Information:

Two-dimensional semiconductor heterostructures provide significant research potential for electronic and optoelectronic applications because of their scaled thickness, pristine heterostructure interface, and ultrafast carrier transport. Herein, we report a dual-channel field-effect transistor based on n-type WS2 and p-type WSe2 layered heterostructure using multilayered graphene as electrodes to enable electron-dominated ambipolar electrical transport. WS2 exhibits mobility of 20 cm2 V–1 s–1 and an on/off ratio of 105, whereas WSe2 exhibits mobility of 5 cm2 V–1 s–1 and an on/off ratio of 104. Furthermore, our results show negative Schottky barrier heights between dual-channel heterostructure and multilayered graphene. The proposed design reduces complications in the fabrication of devices with integrated heterostructures, particularly for complementary metal-oxide semiconductor inverter applications.

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GB/T 7714-2015 [1] Hanul Kim, Jihoon Kim, Inayat Uddin, et al. ACS Applied Electronic Materials, 2023(5). DOI:10.1021/acsaelm.2c01465.
MLA [1] Hanul Kim, et al., ACS Applied Electronic Materials, no. 5, 2023, https://doi.org/10.1021/acsaelm.2c01465.
APA [1] Hanul Kim, Jihoon Kim, Inayat Uddin, Nhat Anh Nguyen Phan, Dongmok Whang, & GilHo Kim. (2023). ACS Applied Electronic Materials(5). https://doi.org/10.1021/acsaelm.2c01465
IEEE [1] Hanul Kim, Jihoon Kim, Inayat Uddin, Nhat Anh Nguyen Phan, Dongmok Whang, and GilHo Kim, ACS Applied Electronic Materials, no. 5, 2023, doi: 10.1021/acsaelm.2c01465. keywords: {graphene electrode dual channel gate tunable WSe2 WS2}