Continuous-Wave Green Laser Activation of Transparent InZnO Electrodes for Fully Solution-Processed Oxide Thin-Film Transistors AITranslate
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Thin-film electronics integration onto large-scale flexible substrates is making huge advancements in many sectors, which include display technology and health care. This requires both large-area deposition and low-temperature fabrication strategies to be suitable for heat-sensitive substrates. In this context, solution processing is preferred over conventional vacuum techniques as it eliminates the use of complex and high-energy equipment and is compatible with atmospheric processing, making it favorable for high throughput roll-to-roll processing. In this work, we demonstrate a full solution approach for oxide thin-film transistor (TFT) fabrication using a spin-coating technique. Amorphous InZnO (a-IZO) is used for both the semiconductor and electrode layers, while fluorinated polysilsesquioxane is used as the gate insulator. By utilization of a top-gate self-aligned structure, the channel and electrode regions in a single a-IZO layer can be defined. In order to achieve a functional TFT, a continuous-wave green laser with a wavelength of 532 nm is irradiated onto the device to modify the electrical properties of a-IZO and transform regions of the semiconductive oxide into a conductive electrode. The fully solution-processed a-IZO TFT reaches a linear mobility of 14.6 cm2 V–1 s–1 and an on–off current ratio in the order of 108, which rivals the performance of vacuum-processed oxide TFTs. Our analyses show the retention of the amorphous structure of IZO accompanied by changes in the chemical bonding in the metal-oxide network. The enhancement in the conductivity of a-IZO is proposed to be related to oxygen vacancy generation and formation of In–In bonds, as suggested by the observed shift of the XPS O 1s spectra to a higher binding energy and of the XPS In 3d spectra to a lower binding energy. These findings demonstrate the suitability of continuous-wave green laser irradiation to tailor the electrical properties of metal oxides and its potential for low-temperature device fabrication.
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DOI:https://doi.org/10.1021/acsaelm.3c00968
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Thin-film electronics integration onto large-scale flexible substrates is making huge advancements in many sectors, which include display technology and health care. This requires both large-area deposition and low-temperature fabrication strategies to be suitable for heat-sensitive substrates. In this context, solution processing is preferred over conventional vacuum techniques as it eliminates the use of complex and high-energy equipment and is compatible with atmospheric processing, making it favorable for high throughput roll-to-roll processing. In this work, we demonstrate a full solution approach for oxide thin-film transistor (TFT) fabrication using a spin-coating technique. Amorphous InZnO (a-IZO) is used for both the semiconductor and electrode layers, while fluorinated polysilsesquioxane is used as the gate insulator. By utilization of a top-gate self-aligned structure, the channel and electrode regions in a single a-IZO layer can be defined. In order to achieve a functional TFT, a continuous-wave green laser with a wavelength of 532 nm is irradiated onto the device to modify the electrical properties of a-IZO and transform regions of the semiconductive oxide into a conductive electrode. The fully solution-processed a-IZO TFT reaches a linear mobility of 14.6 cm2 V–1 s–1 and an on–off current ratio in the order of 108, which rivals the performance of vacuum-processed oxide TFTs. Our analyses show the retention of the amorphous structure of IZO accompanied by changes in the chemical bonding in the metal-oxide network. The enhancement in the conductivity of a-IZO is proposed to be related to oxygen vacancy generation and formation of In–In bonds, as suggested by the observed shift of the XPS O 1s spectra to a higher binding energy and of the XPS In 3d spectra to a lower binding energy. These findings demonstrate the suitability of continuous-wave green laser irradiation to tailor the electrical properties of metal oxides and its potential for low-temperature device fabrication.
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| GB/T 7714-2015 | [1] Dianne C. Corsino, Juan Paolo S. Bermundo, Muhammad Arif Razali, et al. ACS Applied Electronic Materials, 2023(5). DOI:10.1021/acsaelm.3c00968. |
| MLA | [1] Dianne C. Corsino, et al., ACS Applied Electronic Materials, no. 5, 2023, https://doi.org/10.1021/acsaelm.3c00968. |
| APA | [1] Dianne C. Corsino, Juan Paolo S. Bermundo, Muhammad Arif Razali, Mutsunori Uenuma, & Yukiharu Uraoka. (2023). ACS Applied Electronic Materials(5). https://doi.org/10.1021/acsaelm.3c00968 |
| IEEE | [1] Dianne C. Corsino, Juan Paolo S. Bermundo, Muhammad Arif Razali, Mutsunori Uenuma, and Yukiharu Uraoka, ACS Applied Electronic Materials, no. 5, 2023, doi: 10.1021/acsaelm.3c00968. keywords: {all solution process continuous wave laser green laser photoactivation oxide semiconductors} |
