Expanding FEBID-Based 3D-Nanoprinting toward Closed High-Fidelity Nanoarchitectures AITranslate
Abstract AITranslate
3D-nanoprinting via focused electron beam induced deposition (FEBID) is a highly flexible additive-fabrication technique that has gained importance in the past few years for its variable design possibilities on the micro and nanoscale. In this work, we show the transition from mesh-like toward closed (sheet-like) structures and the development of necessary compensations (height correction, temperature compensation, and proximity correction) to minimize deviations between the target structure and the actual deposit. To accomplish this, we investigate the growth behavior, the influence of beam heating, and the electron trajectories in extensive experimental series as well as finite-difference simulations. Out of this, we derive a modular Python tool taking all compensations into account, enabling the controlled and accurate deposition of 3D-nanostructures in an individually adjusted layer-by-layer approach. This approach forms the basis for accurately fabricating closed, sheet-like objects on the nanoscale and lays the foundation for depositing complex nanoarchitectures for various applications in research and development.
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DOI:https://doi.org/10.1021/acsaelm.1c01133
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3D-nanoprinting via focused electron beam induced deposition (FEBID) is a highly flexible additive-fabrication technique that has gained importance in the past few years for its variable design possibilities on the micro and nanoscale. In this work, we show the transition from mesh-like toward closed (sheet-like) structures and the development of necessary compensations (height correction, temperature compensation, and proximity correction) to minimize deviations between the target structure and the actual deposit. To accomplish this, we investigate the growth behavior, the influence of beam heating, and the electron trajectories in extensive experimental series as well as finite-difference simulations. Out of this, we derive a modular Python tool taking all compensations into account, enabling the controlled and accurate deposition of 3D-nanostructures in an individually adjusted layer-by-layer approach. This approach forms the basis for accurately fabricating closed, sheet-like objects on the nanoscale and lays the foundation for depositing complex nanoarchitectures for various applications in research and development.
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| GB/T 7714-2015 | [1] Anna Weitzer, Michael Huth, Gerald Kothleitner, et al. ACS Applied Electronic Materials, 2022(4). DOI:10.1021/acsaelm.1c01133. |
| MLA | [1] Anna Weitzer, et al., ACS Applied Electronic Materials, no. 4, 2022, https://doi.org/10.1021/acsaelm.1c01133. |
| APA | [1] Anna Weitzer, Michael Huth, Gerald Kothleitner, & Harald Plank. (2022). ACS Applied Electronic Materials(4). https://doi.org/10.1021/acsaelm.1c01133 |
| IEEE | [1] Anna Weitzer, Michael Huth, Gerald Kothleitner, and Harald Plank, ACS Applied Electronic Materials, no. 4, 2022, doi: 10.1021/acsaelm.1c01133. keywords: {additive manufacturing directwrite nanofabrication focused electron beam induced deposition 3D nanoprinting metal nanostructures electron trajectory simulations thermal simulations} |
