Continuous Annealing of Ta Wire with Oxide Film and Its Flatness AITranslate
Abstract AITranslate
Based on the Comparison between the continuous annealing of Ta wire with oxide film and the original technology, and on the analysis of the relation between the continuous annealing , oxygenated parameters ,and the wire flatness, it is proven that the continuous annealing of wire with oxide film has an advantage over the original stacked annealing, as is an important technical breakthrough in the Ta wire production.
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Basic Information:
DOI：
Chinese Library Classification Number:TM535.1[电气工程—电器];TG146.416[金属学及工艺—金属材料]
Citation Information:
Based on the Comparison between the continuous annealing of Ta wire with oxide film and the original technology, and on the analysis of the relation between the continuous annealing , oxygenated parameters ,and the wire flatness, it is proven that the continuous annealing of wire with oxide film has an advantage over the original stacked annealing, as is an important technical breakthrough in the Ta wire production.
quote
| GB/T 7714-2015 | [1] XU Ling-bin. Continuous Annealing of Ta Wire with Oxide Film and Its Flatness[J]. Rare Metals and Cemented Carbides, 1999(4): 11-14. |
| MLA | [1] XU Ling-bin. "Continuous Annealing of Ta Wire with Oxide Film and Its Flatness." Rare Metals and Cemented Carbides, no. 4, 1999, pp. 11-14. |
| APA | [1] XU Ling-bin. (1999). Continuous Annealing of Ta Wire with Oxide Film and Its Flatness. Rare Metals and Cemented Carbides(4), 11-14. |
| IEEE | [1] XU Ling-bin, "Continuous Annealing of Ta Wire with Oxide Film and Its Flatness," Rare Metals and Cemented Carbides, no. 4, pp. 11-14, 1999. keywords: {Ta wire;continuous annealing of Ta wire with oxide film;flatness} |