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Nanoscale Subsurface Morphologies in Block Copolymer Thin Films Revealed by Combined Near-Field Infrared Microscopy and Mechanical Mapping AITranslate

Kevin Ho; Kris S. Kim; Leonid Gilburd; Ruben Mirzoyan; Sissi de Beer; Gilbert C. Walker;
University of Toronto; University of Toronto; University of Toronto; University of Toronto; University of Twente; University of Toronto
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Publisher: ACS
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Abstract AITranslate

Block copolymer (BCP) thin films are commonly characterized by techniques that either lack nanometric spatial resolution or the ability for subsurface characterization. In this work, we combine scanning near-field optical microscopy and atomic force microscopy mechanical mapping to probe the subsurface composition of poly(styrene-block-tert-butyl acrylate) thin film with nanometric spatial resolution and compare our results to a theoretical description. Our work demonstrates a novel imaging approach for interrogating the internal morphology of BCP thin films. A better understanding of subsurface morphologies will enable better design principles for nanolithography and templating thin films for photonics, photovoltaics, and tissue engineering.

KeyWords AITranslate

nearfield optical microscopy subsurface imaging atomic force microscopy mechanical properties block copolymer thin film
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Basic Information:

DOI：https://doi.org/10.1021/acsapm.9b00189

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Citation Information:

Block copolymer (BCP) thin films are commonly characterized by techniques that either lack nanometric spatial resolution or the ability for subsurface characterization. In this work, we combine scanning near-field optical microscopy and atomic force microscopy mechanical mapping to probe the subsurface composition of poly(styrene-block-tert-butyl acrylate) thin film with nanometric spatial resolution and compare our results to a theoretical description. Our work demonstrates a novel imaging approach for interrogating the internal morphology of BCP thin films. A better understanding of subsurface morphologies will enable better design principles for nanolithography and templating thin films for photonics, photovoltaics, and tissue engineering.

quote

GB/T 7714-2015 [1] Kevin Ho, Kris S. Kim, Leonid Gilburd, et al. ACS Applied Polymer Materials, 2019(1). DOI:10.1021/acsapm.9b00189.
MLA [1] Kevin Ho, et al., ACS Applied Polymer Materials, no. 1, 2019, https://doi.org/10.1021/acsapm.9b00189.
APA [1] Kevin Ho, Kris S. Kim, Leonid Gilburd, Ruben Mirzoyan, Sissi de Beer, & Gilbert C. Walker. (2019). ACS Applied Polymer Materials(1). https://doi.org/10.1021/acsapm.9b00189
IEEE [1] Kevin Ho, Kris S. Kim, Leonid Gilburd, Ruben Mirzoyan, Sissi de Beer, and Gilbert C. Walker, ACS Applied Polymer Materials, no. 1, 2019, doi: 10.1021/acsapm.9b00189. keywords: {nearfield optical microscopy;subsurface imaging;atomic force microscopy;mechanical properties;block copolymer;thin film}