Study on Removal of Trace Amounts of Phosphorus, Arsenic and Silicon from Impure Sodium Tungstate Solution by Extraction Chromatography AITranslate

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Chinese Library Classification Number:TQ131.12[化学工程—无机化工];TQ028.32[化学工程]

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The extraction behavior of tungsten and phosphorus in alkalescent solution(pH= 7.80 ～8.32) by CL N 1923 LEVEXTREL resin and the conditions for separating the trace phosphorus,arsenic,silicon from the tungsten in impure sodium tungstate solution were investigated.The results of static and dynamic experimental method showed that the resin may separate the trace amounts of phosphorus and silicon from the tungsten in impure sodium tungstate solution effectively.The content of phosphorus、arsenic and silicon in real industrial sodium tungstate solution was decreased to below 0.015,0.030,0.010 g.L -1 from 0.05～0.50,0.04～0.10,0.050～0.30 g.L -1 respectively,the removal rate of phosphorus,arsenic and silicon may get to 97.6%,81.6%,100%,the one pass recovery of high pure tungsten may reach 80%.