MoS2-on-GaN Plasmonic Photodetector Using a Bowtie Striped Antenna Structure MoS2-on-GaN Plasmonic Photodetector Using a Bowtie Striped Antenna Structure AITranslate
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The layered semiconductor material molybdenum disulfide (MoS2) has led to an upsurge in research for applications in optoelectric devices that benefit from its excellent optical and electrical properties. The application of the plasmonic structure to enhance light–matter interaction and intensity of the light field via localized surface plasmon resonance provides a promising method for MoS2-based devices for improving performance. In this work, we have prepared a plasmon-enhanced few-layer MoS2 photodetector based on a gallium nitride substrate using a bowtie equal grid antenna structure, and the large-scale few-layer MoS2 growth on the GaN substrate is realized by chemical vapor deposition. The enhancement MoS2 plasmonic photodetector achieves a high responsivity R of 0.82 A/W, a low noise equivalent power NEP of 6.58 × 10–14 W/Hz1/2, and a detectivity of 1.56 × 1012 Jones under 365 nm at 5 V bias and a corresponding rise/fall time of 18/10 ms. With the enhanced performance of the photodetector demonstrated, the as-fabricated plasmonic structure proposed a feasibility method to achieve enhanced photoresponse and is applicable to other high-efficiency photoelectric devices.
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DOI:https://doi.org/10.1021/acsaelm.2c00958
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The layered semiconductor material molybdenum disulfide (MoS2) has led to an upsurge in research for applications in optoelectric devices that benefit from its excellent optical and electrical properties. The application of the plasmonic structure to enhance light–matter interaction and intensity of the light field via localized surface plasmon resonance provides a promising method for MoS2-based devices for improving performance. In this work, we have prepared a plasmon-enhanced few-layer MoS2 photodetector based on a gallium nitride substrate using a bowtie equal grid antenna structure, and the large-scale few-layer MoS2 growth on the GaN substrate is realized by chemical vapor deposition. The enhancement MoS2 plasmonic photodetector achieves a high responsivity R of 0.82 A/W, a low noise equivalent power NEP of 6.58 × 10–14 W/Hz1/2, and a detectivity of 1.56 × 1012 Jones under 365 nm at 5 V bias and a corresponding rise/fall time of 18/10 ms. With the enhanced performance of the photodetector demonstrated, the as-fabricated plasmonic structure proposed a feasibility method to achieve enhanced photoresponse and is applicable to other high-efficiency photoelectric devices.
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| GB/T 7714-2015 | [1] Xinke Liu, Yuheng Lin, Zhichen Lin, et al. ACS Applied Electronic Materials, 2022(4). DOI:10.1021/acsaelm.2c00958. |
| MLA | [1] Xinke Liu, et al., ACS Applied Electronic Materials, no. 4, 2022, https://doi.org/10.1021/acsaelm.2c00958. |
| APA | [1] Xinke Liu, Yuheng Lin, Zhichen Lin, Jiangchuan Wang, Ziyue Zhang, Yugeng Li, Xiaohua Li, Deliang Zhu, KahWee Ang, Ming Fang, Wangying Xu, Qi Wang, Wenjie Yu, Qiang Liu, & Shuangwu Huang. (2022). ACS Applied Electronic Materials(4). https://doi.org/10.1021/acsaelm.2c00958 |
| IEEE | [1] Xinke Liu, Yuheng Lin, Zhichen Lin, Jiangchuan Wang, Ziyue Zhang, Yugeng Li, Xiaohua Li, Deliang Zhu, KahWee Ang, Ming Fang, Wangying Xu, Qi Wang, Wenjie Yu, Qiang Liu, and Shuangwu Huang, ACS Applied Electronic Materials, no. 4, 2022, doi: 10.1021/acsaelm.2c00958. keywords: {fewlayer MoS2 plasmonic surface plasmon resonance photodetector antenna structure aluminum grating} |
