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Liquidus projection of the Al–Nb–V system AITranslate

Universidade de São Paulo; Universidade de São Paulo; Universidade de São Paulo; Universidade Federal de Itajubá; Universidade de São Paulo; Universidade de São Paulo; Universidade de São Paulo; Universidade de São Paulo
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Publisher: Elsevier
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Abstract AITranslate

In the present work, the liquidus projection of the Al–Nb–V system is proposed for the first time. It corresponds to important data for the design of innovative low-density Al-containing refractory high-entropy alloys. Experimental investigation was carried out via microstructural characterization of fifty-six alloys in as-cast state using scanning electron microscopy (SEM), electron dispersive X-ray spectroscopy (EDS) and X-ray diffractometry (XRD). Results showed no signs of ternary phases and only primary precipitation fields from binary phases were observed. The BCC primary precipitation field is dominant, while V5Al8 primary precipitation field is restricted to a small region close to Al–V binary. Three class II (UI, UII and UIII) ternary invariant reactions were proposed.

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DOI:https://doi.org/10.1016/j.calphad.2020.102196

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Citation Information:

In the present work, the liquidus projection of the Al–Nb–V system is proposed for the first time. It corresponds to important data for the design of innovative low-density Al-containing refractory high-entropy alloys. Experimental investigation was carried out via microstructural characterization of fifty-six alloys in as-cast state using scanning electron microscopy (SEM), electron dispersive X-ray spectroscopy (EDS) and X-ray diffractometry (XRD). Results showed no signs of ternary phases and only primary precipitation fields from binary phases were observed. The BCC primary precipitation field is dominant, while V5Al8 primary precipitation field is restricted to a small region close to Al–V binary. Three class II (UI, UII and UIII) ternary invariant reactions were proposed.

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GB/T 7714-2015 [1] J.C.P. Santos, N. Chaia, K.E. Borowski, et al. Calphad, 2020(71). DOI:10.1016/j.calphad.2020.102196.
MLA [1] J.C.P. Santos, et al., Calphad, no. 71, 2020, https://doi.org/10.1016/j.calphad.2020.102196.
APA [1] J.C.P. Santos, N. Chaia, K.E. Borowski, A.A.A.P. da Silva, D.F. Barros, D.A. Abreu, C.A. Nunes, & G.C. Coelho. (2020). Calphad(71). https://doi.org/10.1016/j.calphad.2020.102196
IEEE [1] J.C.P. Santos, N. Chaia, K.E. Borowski, A.A.A.P. da Silva, D.F. Barros, D.A. Abreu, C.A. Nunes, and G.C. Coelho, Calphad, no. 71, 2020, doi: 10.1016/j.calphad.2020.102196.