Liquidus projection of the Al–Nb–V system AITranslate
Abstract AITranslate
In the present work, the liquidus projection of the Al–Nb–V system is proposed for the first time. It corresponds to important data for the design of innovative low-density Al-containing refractory high-entropy alloys. Experimental investigation was carried out via microstructural characterization of fifty-six alloys in as-cast state using scanning electron microscopy (SEM), electron dispersive X-ray spectroscopy (EDS) and X-ray diffractometry (XRD). Results showed no signs of ternary phases and only primary precipitation fields from binary phases were observed. The BCC primary precipitation field is dominant, while V5Al8 primary precipitation field is restricted to a small region close to Al–V binary. Three class II (UI, UII and UIII) ternary invariant reactions were proposed.
KeyWords AITranslate
Basic Information:
DOI:https://doi.org/10.1016/j.calphad.2020.102196
Chinese Library Classification Number:
Citation Information:
In the present work, the liquidus projection of the Al–Nb–V system is proposed for the first time. It corresponds to important data for the design of innovative low-density Al-containing refractory high-entropy alloys. Experimental investigation was carried out via microstructural characterization of fifty-six alloys in as-cast state using scanning electron microscopy (SEM), electron dispersive X-ray spectroscopy (EDS) and X-ray diffractometry (XRD). Results showed no signs of ternary phases and only primary precipitation fields from binary phases were observed. The BCC primary precipitation field is dominant, while V5Al8 primary precipitation field is restricted to a small region close to Al–V binary. Three class II (UI, UII and UIII) ternary invariant reactions were proposed.
quote
| GB/T 7714-2015 | [1] J.C.P. Santos, N. Chaia, K.E. Borowski, et al. Calphad, 2020(71). DOI:10.1016/j.calphad.2020.102196. |
| MLA | [1] J.C.P. Santos, et al., Calphad, no. 71, 2020, https://doi.org/10.1016/j.calphad.2020.102196. |
| APA | [1] J.C.P. Santos, N. Chaia, K.E. Borowski, A.A.A.P. da Silva, D.F. Barros, D.A. Abreu, C.A. Nunes, & G.C. Coelho. (2020). Calphad(71). https://doi.org/10.1016/j.calphad.2020.102196 |
| IEEE | [1] J.C.P. Santos, N. Chaia, K.E. Borowski, A.A.A.P. da Silva, D.F. Barros, D.A. Abreu, C.A. Nunes, and G.C. Coelho, Calphad, no. 71, 2020, doi: 10.1016/j.calphad.2020.102196. |
