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Transparent and Photochromic Material Prepared by Copolymerization of Bismuth(III) Methacrylate AITranslate

Bungo Ochiai; Kohei Kikuta; Yoshimasa Matsumura; Hiroshi Horikoshi; Kikuo Furukawa; Miyuki Miyamoto; Yoshio Nishimura
Yamagata University; Yamagata University; Yamagata University;Mitsubishi Gas Chemical Company, Inc.;Mitsubishi Gas Chemical Company, Inc.;Mitsubishi Gas Chemical Company, Inc.;Mitsubishi Gas Chemical Company, Inc.
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Publisher: ACS
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Abstract AITranslate

Transparent, photochromic, and X-ray shielding polymer films were obtained by bulk radical copolymerization of bismuth(III) methacrylate (BiMA), easily synthesized from Ph3Bi and methacrylic acid, and N,N-dimethylacrylamide (DMAA). The refractive indices and X-ray shielding abilities were increased as the increase of the bismuth content. The photochromism, coloring by UV irradiation and discoloring under ambient conditions, occurs by reversible redox between the bismuth carboxylate structure and Bi(0). The facile preparation procedure using inexpensive substances is an advantage over those of previously reported bismuth-containing polymers.

KeyWords AITranslate

transparent material photochromism Xray shielding material bismuth radical polymerization
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Basic Information:

DOI：https://doi.org/10.1021/acsapm.1c00710

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Citation Information:

Transparent, photochromic, and X-ray shielding polymer films were obtained by bulk radical copolymerization of bismuth(III) methacrylate (BiMA), easily synthesized from Ph3Bi and methacrylic acid, and N,N-dimethylacrylamide (DMAA). The refractive indices and X-ray shielding abilities were increased as the increase of the bismuth content. The photochromism, coloring by UV irradiation and discoloring under ambient conditions, occurs by reversible redox between the bismuth carboxylate structure and Bi(0). The facile preparation procedure using inexpensive substances is an advantage over those of previously reported bismuth-containing polymers.

quote

GB/T 7714-2015 [1] Bungo Ochiai, Kohei Kikuta, Yoshimasa Matsumura, et al. ACS Applied Polymer Materials, 2021(3). DOI:10.1021/acsapm.1c00710.
MLA [1] Bungo Ochiai, et al., ACS Applied Polymer Materials, no. 3, 2021, https://doi.org/10.1021/acsapm.1c00710.
APA [1] Bungo Ochiai, Kohei Kikuta, Yoshimasa Matsumura, Hiroshi Horikoshi, Kikuo Furukawa, Miyuki Miyamoto, & Yoshio Nishimura. (2021). ACS Applied Polymer Materials(3). https://doi.org/10.1021/acsapm.1c00710
IEEE [1] Bungo Ochiai, Kohei Kikuta, Yoshimasa Matsumura, Hiroshi Horikoshi, Kikuo Furukawa, Miyuki Miyamoto, and Yoshio Nishimura, ACS Applied Polymer Materials, no. 3, 2021, doi: 10.1021/acsapm.1c00710. keywords: {transparent material;photochromism;Xray shielding material;bismuth;radical polymerization}