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Structural Effects of Cinnamoyl-Indanone-Based Photobleachable Free Radical Visible Initiators AITranslate

Tongji University; Wuhan University; Wuhan University; Wuhan University; Wuhan University; Wuhan University; Wuhan University
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Publisher: ACS
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Abstract AITranslate

In order to study the photobleaching property of photoinitiators sensitive to visible light, in this work, a series of visible photoinitiators cinnamoyl-indanones (CA-IDs) were designed and synthesized by the Knoevenagel condensation reaction. Their D-π-A structures possess wide absorptions in the visible region (400–600 nm) as well as high molar extinction coefficients. The results of electron paramagnetic resonance (EPR) and steady-state photolysis showed that CA-ID-3–7 can yield α-aminoalkyl radicals and lead to photolysis. In addition, the photopolymerization kinetics indicated that CA-ID-3–7 could successfully initiate the photopolymerization of HDDA (1,6-hexanedioldiacrylate), and CA-ID-4 exhibited the highest photoinitiating efficiency among these photoinitiators. In addition, CA-ID-4/MDEA (N-methyldiethanolamine) demonstrated a comparable initiating efficiency as CQ (camphorquinone)/MDEA. The results of theoretical calculation experiments illustrated that the introduction of ortho groups (alkyl or aminoalkyl) to double bonds on the benzene ring in cinnamyl-indanedione is an effective way to develop photoinitiators with high light absorption in the visible light region for radical polymerization. Combined with the analysis of EPR, the possible mechanism for generating active radicals upon the appropriate wavelength LED exposure was proposed. The results of the curing depth experiment implied that CA-IDs have great potential applications in deep curing materials.

KeyWords AITranslate

photoinitiators visible light photobleachable photopolymerization curing depth
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Basic Information:

DOI:https://doi.org/10.1021/acsapm.2c00885

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Citation Information:

In order to study the photobleaching property of photoinitiators sensitive to visible light, in this work, a series of visible photoinitiators cinnamoyl-indanones (CA-IDs) were designed and synthesized by the Knoevenagel condensation reaction. Their D-π-A structures possess wide absorptions in the visible region (400–600 nm) as well as high molar extinction coefficients. The results of electron paramagnetic resonance (EPR) and steady-state photolysis showed that CA-ID-3–7 can yield α-aminoalkyl radicals and lead to photolysis. In addition, the photopolymerization kinetics indicated that CA-ID-3–7 could successfully initiate the photopolymerization of HDDA (1,6-hexanedioldiacrylate), and CA-ID-4 exhibited the highest photoinitiating efficiency among these photoinitiators. In addition, CA-ID-4/MDEA (N-methyldiethanolamine) demonstrated a comparable initiating efficiency as CQ (camphorquinone)/MDEA. The results of theoretical calculation experiments illustrated that the introduction of ortho groups (alkyl or aminoalkyl) to double bonds on the benzene ring in cinnamyl-indanedione is an effective way to develop photoinitiators with high light absorption in the visible light region for radical polymerization. Combined with the analysis of EPR, the possible mechanism for generating active radicals upon the appropriate wavelength LED exposure was proposed. The results of the curing depth experiment implied that CA-IDs have great potential applications in deep curing materials.

quote

GB/T 7714-2015 [1] Wen Liao, Qiuyan Liao, Can Xu, et al. ACS Applied Polymer Materials, 2022(4). DOI:10.1021/acsapm.2c00885.
MLA [1] Wen Liao, et al., ACS Applied Polymer Materials, no. 4, 2022, https://doi.org/10.1021/acsapm.2c00885.
APA [1] Wen Liao, Qiuyan Liao, Can Xu, Xiang Wu, Ying Xiong, Zhen Li, & Hongding Tang. (2022). ACS Applied Polymer Materials(4). https://doi.org/10.1021/acsapm.2c00885
IEEE [1] Wen Liao, Qiuyan Liao, Can Xu, Xiang Wu, Ying Xiong, Zhen Li, and Hongding Tang, ACS Applied Polymer Materials, no. 4, 2022, doi: 10.1021/acsapm.2c00885. keywords: {photoinitiators;visible light;photobleachable;photopolymerization;curing depth}