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Photopatterning of PEDOT Derivatives with Photoacid Generators and Acid Amplifiers Generating Polystyrenesulfonic Acid AITranslate

Koji Arimitsu; Eishiro Hiraga; Masahiro Furutani;
Tokyo University of Science; Tokyo University of Science; Tokyo University of Science
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Publisher: ACS
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Abstract AITranslate

Photopatterning of PEDOT–PSS is desired but troublesome due to the insolubility of PEDOT and no alternatives of generating PSS in the film. We synthesized acid amplifiers (AAs) that can generate PSS autocatalytically. The AAs increase the concentration of PSS, with a catalytic amount of acids from PAGs. Furthermore, we used PEDOT–PEGs (PEDOT:polyethylene glycols) that disperse easily in organic solvents. By using these AAs, PEDOT–PEGs, and PAGs, we obtained photopatterns of PEDOT–PSS in a dry process. The obtained patterns had high transparency as well as a 106 order of difference in conductivity between the exposed (semiconductor) and unexposed (insulator) parts.

KeyWords AITranslate

PEDOT−PSS acid amplifier photopatterning dry process photoacid generator
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Basic Information:

DOI：https://doi.org/10.1021/acsapm.9b00052

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Citation Information:

Photopatterning of PEDOT–PSS is desired but troublesome due to the insolubility of PEDOT and no alternatives of generating PSS in the film. We synthesized acid amplifiers (AAs) that can generate PSS autocatalytically. The AAs increase the concentration of PSS, with a catalytic amount of acids from PAGs. Furthermore, we used PEDOT–PEGs (PEDOT:polyethylene glycols) that disperse easily in organic solvents. By using these AAs, PEDOT–PEGs, and PAGs, we obtained photopatterns of PEDOT–PSS in a dry process. The obtained patterns had high transparency as well as a 106 order of difference in conductivity between the exposed (semiconductor) and unexposed (insulator) parts.

quote

GB/T 7714-2015 [1] Koji Arimitsu, Eishiro Hiraga, Masahiro Furutani. ACS Applied Polymer Materials, 2019(1). DOI:10.1021/acsapm.9b00052.
MLA [1] Koji Arimitsu, et al., ACS Applied Polymer Materials, no. 1, 2019, https://doi.org/10.1021/acsapm.9b00052.
APA [1] Koji Arimitsu, Eishiro Hiraga, & Masahiro Furutani. (2019). ACS Applied Polymer Materials(1). https://doi.org/10.1021/acsapm.9b00052
IEEE [1] Koji Arimitsu, Eishiro Hiraga, and Masahiro Furutani, ACS Applied Polymer Materials, no. 1, 2019, doi: 10.1021/acsapm.9b00052. keywords: {PEDOT−PSS;acid amplifier;photopatterning;dry process;photoacid generator}